学術論文

学術論文
  • Influence of Iron Diffusion on the Oxidation Resistance of CrSiCN Hard Coatings
    M. Hatakeyama, T. Tsuchiya, S. Lee, K. Matsuda, Y. Aoi, M. Nose
    Mater. Trans. 63 (2022) 422-429.
  • Carbon nanofibers preparation from pan nanofibers by cotton candy method
    A. Tada, J. Boonlertsamut, S. Thumsorn, M. Okoshi, H. Inoya, H. Hamada, Y. Aoi
    Annu. Tech. Conf. – ANTEC, Conf. Proc., 2017.
  • Preparation and Optical Properties of Spherical Inverse Opals by Liquid Phase Deposition Using Spherical Colloidal Crystals
    Y. Aoi, T. Tominaga
    J. Phys. Conf. Ser. 417 (2013) 012021.
    DOI: 10.1088/1742-6596/417/1/012021
  • Formation of self-assembled monolayer on pulsed laser deposited amorphous carbon thin films
    H. Hara, Y. Aoi
    Proc. Twelfth Int. Symp. Sputtering Plasma Process. (2013) 335–338.
  • Surface modification of amorphous carbon thin films by 1,3-dipolar cycloaddition
    Y. Aoi, A. Tada
    Diamond Relat. Mater. 38 (2013) 63–68.
    DOI: 10.1016/j.diamond.2013.06.014
  • Covalent surface modification of ECR plasma sputtered amorphous carbon thin films
    T. Okubo, A. Tada, T. Iwasawa, Y. Aoi
    Proc. Twelfth Int. Symp. Sputtering Plasma Process. (2013) 323–326.
  • Relationship Between Microstructure and Hardness of ZrN/TiN Multi-Layers with Various Bilayer Thicknesses
    Y. Aoi, S. Furuhata, H. Nakano
    Adv. Sci. Technol. 63 (2010) 392–395.
    DOI: 10.4028/www.scientific.net/AST.63.392
  • Optical Properties of Au Nano-Particles Contained TiO2 Inverse Opal
    T. Nishinosono, H. Nakano, Y. Aoi
    J. Soc. Mater. Sci. Japan. 58 (2009) 516–520.
    DOI: 10.2472/jsms.58.516
  • Amorphous carbon coated stainless separator for PEFCs
    Y. Mori, M. Ueda, M. Hashimoto, Y. Aoi, S. Tanase, T. Sakai
    Surf. Coatings Technol. 202 (2008) 4094–4101.
    DOI: 10.1016/j.surfcoat.2008.02.020
  • Copper nanoparticles fabricated by laser ablation in polysiloxane
    M. Saito, K. Yasukawa, T. Umeda, Y. Aoi
    Opt. Mater. (Amst). 30 (2008) 1201–1204.
    DOI: 10.1016/j.optmat.2007.05.049
  • 固体高分子型燃料電池用炭素被覆ステンレス製セパレータの開発とその発電特性
    植田雅巳, 森陽一, 橋本勝, 山室成樹, 棚瀬繁雄, 青井芳史, 岩佐美喜男, 境哲男
    日本金属学会誌. 71 (2007) 545–552.
    DOI: 10.2320/jinstmet.71.545
  • Synthesis of nanostructured metal oxide by liquid-phase deposition
    Y. Aoi, H. Kambayashi, T. Deguchi, K. Yato, S. Deki
    Electrochim. Acta. 53 (2007) 175–178.
    DOI: 10.1016/j.electacta.2007.01.033
  • Fabrication of three-dimensional ordered macroporous titanium oxide by the liquid-phase deposition method using colloidal template
    Y. Aoi, S. Kobayashi, E. Kamijo, S. Deki
    J. Mater. Sci. 40 (2005) 5561–5563.
    DOI: 10.1007/s10853-005-4551-6
  • 液相析出法による3次元規則構造を有する多孔質酸化チタンの合成とその物性
    青井芳史, 神林久栄, 小林小百合, 上條栄治, 出来成人
    材料. 53 (2004) 1313–1317.
    DOI: 10.2472/jsms.53.1313
  • Pulsed laser deposition of amorphous carbon nitride thin films and their electrical properties
    Y. Aoi, K. Sakurada, E. Kamijo
    Appl. Phys. A. 79 (2004) 1533–1536.
    DOI: 10.1007/s00339-004-2840-6
  • セラミックスナノ積層多層薄膜の合成と機械特性
    櫻井篤士, 青井芳史, 上條栄治
    真空 47 (2004) 197-199.
    DOI: 10.3131/jvsj.47.197
  • Synthesis of mesoscopic hollow spheres and inner surface functionalized hollow spheres of titanium dioxide by the liquid phase deposition method
    Y. Aoi, H. Kambayashi, E. Kamijo, S. Deki
    J. Mater. Res. 18 (2003) 2832–2836.
    DOI: 10.1557/JMR.2003.0395
  • Bulk modulus measurement of carbon nitride thin films by the x-ray diffraction under high pressure
    E. Kamijo, Y. Aoi, M. Hisa, W. Utsumi, T. Watanuki, K. Yamaguchi
    Adv. Sci. Technol. 39 (2003) 97–104.
  • Structure and electrical properties of pulsed laser deposited amorphous carbon nitride thin films
    Y. Aoi, K. Ono, K. Sakurada, E. Kamijo
    Mater. Res. Soc. Symp. – Proc., 2002.
    DOI: 10.1557/PROC-750-Y5.1
  • イオンビームスパッタリング法による窒化炭素系積層多層薄膜の合成と評価
    木村友之, 青井芳史, 上條栄治
    真空. 45 (2002) 208–211.
    DOI: 10.3131/jvsj.45.208
  • パルスレーザー堆積法によるB-C-N系薄膜の合成
    青井芳史, 上條栄治
    真空. 45 (2002) 219–222.
    DOI: 10.3131/jvsj.45.219
  • Structural Characterization of Amorphous Carbon Nitride Thin Films Prepared by Pulsed Laser Deposition
    Y. Aoi, K. Sakurada, K. Ono, E. Kamijo
    Key Engineering Materials. 206-213 (2003) 531-534.
    DOI: 10.4028/www.scientific.net/KEM.206-213.531
  • Process Parameters for Synthesis of Carbon Nitride Thin Films using Electron Cyclotron Resonance Plasma Sputter Method
    E. Kamijo, Y. Aoi, T. Hirahara, T. Tochimoto
    Proc. Sixth Appl. Diam. Conf. Front. Carbon Technol. Jt. Conf. (ADC/FCT 2001). (2001) 609–614.
  • パルスレーザー堆積法により合成した非晶質窒化炭素薄膜の構造
    櫻田国士, 小野光治郎, 青井芳史, 上條栄治
    真空. 44 (2001) 175–178.
    DOI: 10.3131/jvsj.44.175
  • Photochromism of diarylethenes on porous aluminum oxide: Fatigue resistance and redox potentials of the photochromes
    K. Uchida, M. Fujita, Y. Aoi, M. Saito, M. Irie
    Chem. Lett. (2001).
    DOI: 10.1246/cl.2001.366
  • Effects of heat treatment on structure of amorphous CNx thin films by pulsed laser deposition
    Y. Aoi, K. Ono, K. Sakurada, E. Kamijo, M. Sasaki, K. Sakayama
    Thin Solid Films. 389 (2001) 62–67.
    DOI: 10.1016/S0040-6090(01)00888-4
  • ラジカルビーム源を用いたパルスレーザー堆積法による窒化炭素薄膜の合成と評価
    小野光治郎, 櫻田国士, 青井芳史, 上條栄治
    真空. 43 (2000) 273–276.
    DOI: 10.3131/jvsj.43.273
  • イオンビームスパッタリング法によるTiN/SiNx積層多層薄膜の合成と評価
    越智敦史, 青井芳史, 上條栄治
    真空. 43 (2000) 299–302.
    DOI: 10.3131/jvsj.43.299
  • Synthesis of Crystalline Carbon Nitride Thin Films by Electron Cyclotron Resonance (ECR) Sputtering Method
    Y. Aoi, Y. Tani, K. Tamaoka, T. Hirahara, M. Hisa, E. Kamijo
    New diamond and frontier carbon technology: an international journal on new diamond, frontier carbon and related materials. 10 (2000) 213-223.
  • Preparation and characterization of carbon nitride thin films by electron cyclotron resonance (ECR) sputtering method
    Y. Aoi, Y. Tani, M. Hisa, E. Kamijo
    Mater. Res. Soc. Symp. – Proc., 1999.
    DOI: 10.1557/PROC-555-419
  • Characterization of carbon nitride thin films prepared by electron cyclotron resonance plasma sputtering method
    E. Kamijo, Y. Aoi, M. Hisa, Y. Tani, K. Tamaoka
    Proc. ADC/FCT ’99. (1999) 307–312.
  • Synthesis of carbon nitride thin films by electron cyclotron resonance plasma sputtering method
    Y. Tani, Y. Aoi, E. Kamijo
    Adv. Sci. Technol. 20 (1999) 211–217.
  • イオンプレーティング法によるセラミックスTiN/CrN積層薄膜の合成と評価
    玉岡克康, 榎孝一, 青井芳史, 上條栄治
    真空. 42 (1999) 265–268.
    DOI: 10.3131/jvsj.42.265
  • Chemical and structural analysis of crystalline carbon nitride thin films prepared by electron cyclotron resonance plasma sputtering process
    Y. Tani, Y. Aoi, E. Kamijo
    Le J. Phys. IV. 09 (1999) Pr8-1131-Pr8-1137.
    DOI: 10.1051/jp4:19998141
  • パルスレーザー堆積法によるB-C-N系薄膜の合成
    高島弘樹, 青井芳史, 上條栄治
    真空. 42 (1999) 225–228.
    DOI: 10.3131/jvsj.42.225
  • High-Resolution Soft X-Ray Emission Spectra of Crystalline Carbon Nitride Films Deposited by Electron Cyclotron Resonance Sputtering
    Y. Muramatsu, Y. Tani, Y. Aoi, E. Kamijo, T. Kaneyoshi, M. Motoyama, J. J. Delaunay, T. Hayashi, M. M. Grush, T. Callcott, D. L. Ederer, C. Heske, J. H. Underwood, R. C. C. Perera
    Jpn. J. Appl. Phys. 38 (1999) 5143–5147.
    DOI: 10.1143/JJAP.38.5143
  • Synthesis of Tetrathiafluvalene Derivatives with Photochromic Diarylethene Moieties
    K. Uchida, G. Masuda, Y. Aoi, K. Nakayama, M. Irie
    Chem. Lett. 28 (1999) 1071-1072.
    DOI: 10.1246/cl.1999.1071
  • Substitution effect on the coloration quantum yield of a photochromic bisbenzothienylethene
    K. Uchida, E. Tsuchida, Y. Aoi, S. Nakamura, M. Irie
    Chem. Lett. 28 (1999) 63-64.
    DOI: 10.1246/cl.1999.63
  • Preparation of amorphous CN thin films by pulsed laser deposition using a radio frequency radical beam source
    Y. Aoi, K. Ono, E. Kamijo
    J. Appl. Phys. 86 (1999) 2318.
    DOI: 10.1063/1.371048
  • Synthesis of carbon nitride films by ECR sputtering deposition method
    Y. Tani, Y. Aoi, E. Kamijo
    1998 International Conference on Ion Implantation Technology. Proceedings (Cat. No.98EX144)
    DOI: 10.1109/IIT.1998.813786
  • 電子サイクロトロン共鳴スパッタリング法による窒化炭素薄膜の合成
    谷庸治, 青井芳史, 上條栄治
    真空. 41 (1998) 512–515.
    DOI: 10.3131/jvsj.41.512
  • Photocatalytic activity of titanium oxide prepared by liquid phase deposition (LPD)
    H. Kishimoto, K. Takahama, N. Hashimoto, Y. Aoi, S. Deki
    J. Mater. Chem. 8 (1998) 2019–2024.
    DOI: 10.1039/a801499j
  • 液相析出法による酸化物薄膜の合成
    出来成人, 青井芳史
    表面. 36 (1998) 313–320.
  • 液相析出（LPD）法による酸化物薄膜の合成
    出来成人, 青井芳史
    表面技術. 49 (1998) 30–34.
    DOI: 10.4139/sfj.49.30
  • Composition and crystal structure of carbon nitride films prepared by the electron cyclotron resonance plasma sputtering method
    Y. Tani, Y. Aoi, E. Kamijo
    Appl. Phys. Lett. 73 (1998) 1652–1654.
    DOI: 10.1063/1.122235
  • Synthesis of metal oxide thin films by liquid-phase deposition method
    S. Deki, Y. Aoi
    J. Mater. Res. 13 (1998) 883–890.
    DOI: 10.1557/JMR.1998.0119
  • Preparation and characterization of iron oxyhydroxide and ironoxide thin films by liquid-phase deposition
    S. Deki, Y. Aoi, J. Okibe, H. Yanagimoto, A. Kajinami, M. Mizuhata
    J. Mater. Chem. 7 (1997) 1769–1772.
    DOI: 10.1039/A700628D
  • A novel wet process for the preparation of vanadium dioxide thin film
    S. Deki, Y. Aoi, A. Kajinami
    J. Mater. Sci. 32 (1997) 4269–4273.
    DOI: 10.1023/A:1018603402586
  • Monitoring the growth of titanium oxide thin films by the liquid-phase deposition method with a quartz crystal microbalance
    S. Deki, Y. Aoi, Y. Asaoka, A. Kajinami, M. Mizuhata
    J. Mater. Chem. 7 (1997) 733–736.
    DOI: 10.1039/A607466I
  • NOVEL WET PROCESS FOR PREPARATION OF VANADIUM OXIDE THIN FILM
    S. Deki, Y. Aoi, Y. Miyake, A. Gotoh, A. Kajinami
    Mater. Res. Bull. 31 (1996) 1399–1406.
    DOI: 10.1016/0025-5408(96)00136-5
  • Preparation and characterization of Au-dispersed TiO2 thin films by a liquid-phase deposition method
    S. Deki, Y. Aoi, H. Yanagimoto, K. Ishii, K. Akamatsu, M. Mizuhata, A. Kajinami
    J. Mater. Chem. 6 (1996) 1879–1882.
    DOI: 10.1039/jm9960601879
  • Titanium (IV) oxide thin films prepared from aqueous solution
    S. Deki, Y. Aoi, O. Hiroi, A. Kajinami
    Chem. Lett. (1996) 433–434.
    DOI: 10.1246/cl.1996.433